Nikon
NSR 2005 G 8 C G Line alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
EV Group
101
Lithography
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
SUSS MicroTec
150 e Mask
Lithography
The SUSS 150 e is a mask aligner manufactured by SUSS MicroTec.
Ultratech
1500
Lithography
Nikon
1505 G 6 E
Lithography
Compare interactively
Need a side-by-side spec table? Open the compare tool to pick any two models.
Compare NSR 2005 G 8 C G Line with another model →