Lithography

The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.

The Laurell SU-8 is a spin station dedicated to applying SU-8 photoresist for lithography processes.

The SUSS ACS200 GEN3 is a modular cluster tool for coating and development of i-line photoresists.

The Karl Suss MA6 is a high-resolution semi-automated photolithography mask aligner for research, development, and small-volume production.

The ASML PAS 5500/850 D is a scanner for 6-inch wafers, using a Cymer ELS-6610 light source and supporting R type, 1.2 mm notch and flat wafers.

The Canon FPA 2500 i 2 is a stepper for semiconductor lithography, with documented vintages of 1993 and 1994.

The EVG EV 640 is a mask aligner for 6- and 8-inch wafers.

The SUSS 150 e is a mask aligner manufactured by SUSS MicroTec.

The Canon FPA 5510 iZ is an i-line stepper for 12-inch wafer processing.

The Nikon NSR 2205 i 12 D is an i-line stepper used in photolithography, available in 6-inch and 8-inch wafer configurations.

The Varian P/N: E 11003911 is a scanner assembly.

The ASML PAS 5500/275D is a high-throughput i-line stepper with 5X reduction, 365 nm exposure, and automated wafer handling for substrates up to 200 mm diameter.

ASML PAS 5000 / 55 A is a stepper identified with an option set that includes Wafer Tilt Monitor.

The ASML PAS 5500 / 700 is a Scanner and a Stepper.

The ASML Twinscan 1200 B is a lithography scanner equipped with a Cymer XLA 160 laser, but it is non-operational due to an internal water leak near the lens and has no lens data available.

The ASML PAS 5500/400 is an i-line stepper for 8-inch wafers with a resolution of 280nm, introduced around 2002.

The PAS 2500 series was the first lithography system developed entirely by ASML and became the system that built the company.

The GCA 8500 is a commercial wafer stepper from GCA that performs 5x-reduction i-line photolithography, accepts 150 mm wafers, and resolves sub-micron features.

The EVG EV-420 is a front and backside contact mask aligner used for UV exposure in lithography.

Nikon NSR 2205 i 14 E 2 is an i-line stepper.

The ASML 2500 / 40 is a stepper with a wafer table, reticle table, P-table, dipod, HP laser, and alignment laser.

The Nikon NSR 2205 i 10 D is an i-line stepper for 6-inch and 8-inch wafers.

Raith EBPG5200 is a direct write electron beam lithography system with high-kV capability and automation features stated in the product page for the EBPG line.

The SUSS MA 150 E Mask Aligner is a 6-inch mask aligner configured with wafer thickness measurement and related alignment accessories.

Tokyo Electron Clean Track ACT-8 is an industry-standard wafer coater and developer used in a DUV lithography cluster with an in-line exposure unit interface.

Heidelberg Instruments VPG200 is a laser pattern generator used for mask production, direct exposure on SEMI-standard wafers, and mask reticles.

The ASML 5500/80 is an i-line wafer stepper with 500nm resolution, <70nm alignment accuracy, and a 21mm x 21mm field size.

The Twinscan NXT 2050 i is a high-productivity deep ultraviolet immersion lithography system for advanced logic and memory nodes.

The Veeco AP 300 E Lithography System is a lithography tool with 2.0 µm resolution, extended-field ghi-line broadband optics, and handling features for 200 mm and 300 mm wafers including warped wafer handling to 500 µm.

General referenceTokyo Electron Mark 8 is a lithography machine used to transfer patterned circuit images onto a photoresist-coated substrate. It belongs to the class of tools that define feature locations for subsequent semiconductor fabrication steps.

The Nikon NSR S 203 B is a DUV scanner described as an 8-inch wafer tool.