Comparison ledger
Oxford Instruments FlexAL and Oxford Instruments OpAL, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | FlexALOxford Instruments | OpALOxford Instruments |
|---|---|---|
| OEM | Oxford Instruments | Oxford Instruments |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments FlexAL | Oxford Instruments OpAL |
| Specifications | ||
| Configuration | Compatible with TiN, TaN, TiO, TaO, SiN[1] | Single open loop chamber (non-loadlocked)[2] |
| Gases | BTBAS, TBTDMT, TDMAT, CF4[1] | — |
| Heated table | — | 80-300ºC[2] |
| Voltage | — | 208V, 3Ph, 60Hz, 25A[2] |
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