Comparison ledger
Oxford Instruments OpAL and Oxford Instruments PlasmaPro NGP 1000, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | OpALOxford Instruments | PlasmaPro NGP 1000Oxford Instruments |
|---|---|---|
| OEM | Oxford Instruments | Oxford Instruments |
| Category | Deposition | Deposition |
| Wafer size | — | up to 450mm wafer size |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments OpAL | Oxford Instruments PlasmaPro NGP 1000 |
| Specifications | ||
| Configuration | Single open loop chamber (non-loadlocked)[1] | Load Locked Chamber[2] |
| Heated table | 80-300ºC[1] | — |
| Voltage | 208V, 3Ph, 60Hz, 25A[1] | — |
| Wafer size | — | up to 450mm wafer size[2] |
| Power | — | 600W 13.56Mhz HF RF Generator[2] |
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