Comparison ledger
Oxford Instruments Plasmalab 100 and Oxford Instruments PlasmaPro NGP 1000, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | Plasmalab 100Oxford Instruments | PlasmaPro NGP 1000Oxford Instruments |
|---|---|---|
| OEM | Oxford Instruments | Oxford Instruments |
| Category | Deposition | Deposition |
| Wafer size | — | up to 450mm wafer size |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments Plasmalab 100 | Oxford Instruments PlasmaPro NGP 1000 |
| Cited variants |
| — |
| Specifications | ||
| Dry pump | Edwards QDP 40[2] | — |
| System Control | HP PC System, Windows XP[2] | — |
| Voltage | 208 VAC, 3 Phase[2] | — |
| Full Load | 25 A[2] | — |
| Configuration | Gas Box:[2] | Load Locked Chamber[3] |
| Gas 1 | MKS 1479 A, 5% SiH4 / N2, 1000 SCCM[2] | — |
| Gas 2 | MKS 1479 A, NH3, 100 SCCM[2] | — |
| Gas 3 | MKS 1179 A, N2, 2000 SCCM[2] | — |
| Gas 4 | MKS 1179 A, N2O, 3000 SCCM[2] | — |
| Gas 5 | MKS 1179 A, ,O2, 300 SCCM[2] | — |
| Gas 6 | MKS 1179 A, Ar, 500 SCCM (TEOS carrier gas)[2] | — |
| TEOS Thermotank | Thermocenter salvis lab[2] | — |
| Chuck | φ202 mm（ φ2’, φ4’, φ6’, φ8’）[2] | — |
| Shower head | φ225 mm[2] | — |
| RF Generator | AE RFX 600 A[2] | — |
| Match Box | OPT AMU Oxford[2] | — |
| LF Generator | AE LF-5[2] | — |
| Wafer size | — | up to 450mm wafer size[3] |
| Power | — | 600W 13.56Mhz HF RF Generator[3] |
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