Waferpedia

Comparison ledger

WD 620 Cversus1000FP

SCREEN WD 620 C, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
WD 620 CSCREEN
OEMSCREENYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer sizefor Si and SiC base wafer—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySCREEN WD 620 CYES 1000FP
Specifications
Wafer sizefor Si and SiC base wafer[1]—
ManufacturerSCREEN[1]—
ModelWD 620 C[2]Glen/YES 1000FP[3]
Tool typeWet bench[2]—
CategoryWet Processing / Clean[1]—
OEMSCREEN / DNS[2]—
Equipment typeWet Bench[2]—
Wafer baseSi and SiC[2]—
System type—Plasma cleaning system[3]
Line—R-Series Plasma Cleaning Systems (Glen Technologies)[3]
Designed use—Designed to accept a range of shelf sizes[3]
Application focus—Changing needs of the flat panel industry[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]Equipment inventory listing
  3. [3]web.archive.orgweb.archive.org