Comparison ledger
SPTS APS and SPTS CPX Pegasus, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | APSSPTS | CPX PegasusSPTS |
|---|---|---|
| OEM | SPTS | SPTS |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SPTS APS | SPTS CPX Pegasus |
| Specifications | ||
| System type | ICP-based high density plasma source[1] | — |
| Optimization target | Dielectric etching[1] | — |
| Processing mode | Single wafer processing[1] | — |
| Clamping | Electrostatic clamping[1] | — |
| End-point detection | Optical Emission Spectroscopy (EOS) and laser reflectometry/interferometry[1] | — |
| Gases available | O2, Ar, CHF3, He, C4F8, SF6, H2[1] | — |
| Configuration | — | 2 Chambers[2] |
| Frequency | — | 60Hz[2] |
| Source RF Generator | — | MKS 6.5 kw RF Power Generator[2] |
| Platen RF Generator | — | MKS/ENI ACG 3B 13.56MHz RF Generator[2] |
| Rotary Pump | — | 3 PCS[2] |
| Turbo pump | — | 2 PCS[2] |
| DI Water | — | SMC HRZ-L2-DY chiller[2] |
| Silicon oil | — | SMC HRZL-D chiller[2] |
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