Comparison ledger
SPTS CPX Pegasus and SPTS Synapse, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | CPX PegasusSPTS | SynapseSPTS |
|---|---|---|
| OEM | SPTS | SPTS |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SPTS CPX Pegasus | SPTS Synapse |
| Specifications | ||
| Configuration | 2 Chambers[1] | — |
| Frequency | 60Hz[1] | — |
| Source RF Generator | MKS 6.5 kw RF Power Generator[1] | — |
| Platen RF Generator | MKS/ENI ACG 3B 13.56MHz RF Generator[1] | — |
| Rotary Pump | 3 PCS[1] | — |
| Turbo pump | 2 PCS[1] | — |
| DI Water | SMC HRZ-L2-DY chiller[1] | — |
| Silicon oil | SMC HRZL-D chiller[1] | — |
| Plasma source | — | ICP-based high density plasma source[2] |
| Dedicated materials | — | Etching of SiO2 and SixNy layers[2] |
| Wafer handling | — | Loadlock/chamber transfers for single wafer processing[2] |
| Clamp type | — | Electrostatic clamping[2] |
| Endpoint detection | — | Optical Emission Spectroscopy (EOS) and laser reflectometry/interferometry[2] |
| Gases available | — | O2, Ar, He, H2, SF6, C4F8, CF4, CHF3[2] |
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