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Comparison ledger

MACS ICPversus110

SPTS MACS ICP, Tegal 110, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
110Tegal
OEMSPTSTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySPTS MACS ICPTegal 110
Cited variants
Specifications
ConfigurationHR chamber[3]—
Clamp typestandard WTC[3]—
Coil RF powerAdvanced Energy RFG3001, 3kw[3]—
Platen RF powerENI ACG-3B 13.56MHZ, 300w[3]—
Load lock pumpEbara AAL10[3]—
Chamber pumpEbara A30W[3]—
Turbo pumpLeybold MAG2000CT[3]—
Turbo Pump ControllerLeybold MAG Drive 2000[3]—
ChillerATS/DEX-20ADI[3]—
ManufacturerSPTS / STS[3]—
ModelMACS ICP[3]—
CategoryEtch[4]—
Wafer size8 inch[3]—
ChamberHR chamber[3]—
Wafer capability6", 8" capable[3]—
Wafer handlingMACS loader for cassette to cassette operation (2 load stations)[3]—
Vacuum load lockCarousel vacuum load lock[3]—
Backside coolingHelium backside cooling (HBC)[3]—
GasesC4F8 (200 sccm); SF6 (1000 sccm); O2 (200 sccm); Ar (50 sccm)[3]—
Vintage2002[3]—
Voltage208 Volts / 60 Hz, 40 Amps/phase[1]—
Chamber quantity1 chamber[5]—
model—110 SE[2]
application focus—process development applications[2]
process capability—deep silicon plasma etching[2]
capabilities—very high aspect ratio trench etch and profile control[2]
configuration—multiple configurations with minimum technical intervention[2]
System type—plasma etch system[6]
Supported components—MEMS and 3D-IC components[2]
Control capability—very high aspect ratio trench etch and profile control[6]
Physical description—compact[2]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]hommer.com.twhommer.com.tw
  2. [2]web.archive.orgweb.archive.org
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com
  5. [5]challentech.com.twchallentech.com.tw
  6. [6]waferpedia.comwaferpedia.com