Waferpedia

Comparison ledger

MVD100E versus MVD300

SPTS MVD100E and SPTS MVD300, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
MVD300SPTS
OEMSPTSSPTS
CategoryDepositionDeposition
Wafer size200mm200mm
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilySPTS MVD100ESPTS MVD300
Cited variants
Specifications
processing modeSingle substrate or small batch processing[2]
wafer size200mm wafers[2]
substrate handlingComponents on trays or racks[2]
chamber volumeSmall chamber volume for fast processing[2]
access designTop-opening for ease of maintenance and cleaning[2]
process capabilityIntegrated plasma surface treatment and chamber clean capability[2]
automationAutomated process sequence routines[2]
diagnosticsExceptional reliability with extensive self-diagnostic and data logging capability[2]
capabilityMVD and ALD-capable[2]
System typeMolecular Vapor Deposition (MVD) system[1]
Configured modelsMVD300 / MVD300E[1]
Target manufacturing useHigh volume manufacturing applications[1]
Processing modeBatch processing[1]
Wafer handling200mm wafers (Pod loader or EFEM available); 300mm wafers (EFEM enabled)[1]
Other substrate formatsSingulated die on tape frames; components on trays; custom substrate fixturing available[1]
PrecursorsUp to 4 precursors[1]
Integrated functionsIntegrated plasma surface treatment and chamber clean capability[1]
AutomationAutomated process sequence routines[1]
DiagnosticsExtensive self-diagnostic and data logging capability[1]
ReliabilityExceptional reliability[1]
Process compatibilityMVD and ALD-capable[1]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.org