Comparison ledger
SPTS MVD100E and SPTS Sigma, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | MVD100ESPTS | SigmaSPTS |
|---|---|---|
| OEM | SPTS | SPTS |
| Category | Deposition | Deposition |
| Wafer size | 200mm | A 1KW lamp for wafer heating |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SPTS MVD100E | SPTS Sigma |
| Specifications | ||
| processing mode | Single substrate or small batch processing[1] | — |
| wafer size | 200mm wafers[1] | — |
| substrate handling | Components on trays or racks[1] | — |
| chamber volume | Small chamber volume for fast processing[1] | — |
| access design | Top-opening for ease of maintenance and cleaning[1] | — |
| process capability | Integrated plasma surface treatment and chamber clean capability[1] | — |
| automation | Automated process sequence routines[1] | — |
| diagnostics | Exceptional reliability with extensive self-diagnostic and data logging capability[1] | — |
| capability | MVD and ALD-capable[1] | — |
| Configuration | — | Beta System[2] |
| Phase | — | Power Box (415 VAC, 3 Phase)[2] |
| Station 1 | — | Vacuum Cassette Handler (VCH)[2] |
| Station 2 | — | Pre Heat Chambers[2] |
| Wafer size | — | A 1KW lamp for wafer heating[2] |
| Station 3 | — | Aluminum Dep Chamber[2] |
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