Waferpedia

Comparison ledger

MVD100E versus Sigma FxP

SPTS MVD100E and SPTS Sigma FxP, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
OEMSPTSSPTS
CategoryDepositionDeposition
Wafer size200mmMk1 3 KW lamp (provide wafer heating)
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilySPTS MVD100ESPTS Sigma
Specifications
processing modeSingle substrate or small batch processing[1]
wafer size200mm wafers[1]
substrate handlingComponents on trays or racks[1]
chamber volumeSmall chamber volume for fast processing[1]
access designTop-opening for ease of maintenance and cleaning[1]
process capabilityIntegrated plasma surface treatment and chamber clean capability[1]
automationAutomated process sequence routines[1]
diagnosticsExceptional reliability with extensive self-diagnostic and data logging capability[1]
capabilityMVD and ALD-capable[1]
Wafer8" compatible[2]
ConfigurationIncludes:[2]
PhasePower Box (415 VAC, 3 Phase)[2]
Station 1Vacuum Cassette Handler (VCH)[2]
Station 2Pre Heat Chamber[2]
Wafer sizeMk1 3 KW lamp (provide wafer heating)[2]
Station 3W Dep Chamber[2]

Plan your fab

Building a Deposition process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]inventory listing