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Comparison ledger

MVD300 versus Sigma FxP

SPTS MVD300 and SPTS Sigma FxP, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
MVD300SPTS
OEMSPTSSPTS
CategoryDepositionDeposition
Wafer size200mmMk1 3 KW lamp (provide wafer heating)
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilySPTS MVD300SPTS Sigma
Cited variants
Specifications
System typeMolecular Vapor Deposition (MVD) system[1]
Configured modelsMVD300 / MVD300E[1]
Target manufacturing useHigh volume manufacturing applications[1]
Processing modeBatch processing[1]
Wafer handling200mm wafers (Pod loader or EFEM available); 300mm wafers (EFEM enabled)[1]
Other substrate formatsSingulated die on tape frames; components on trays; custom substrate fixturing available[1]
PrecursorsUp to 4 precursors[1]
Integrated functionsIntegrated plasma surface treatment and chamber clean capability[1]
AutomationAutomated process sequence routines[1]
DiagnosticsExtensive self-diagnostic and data logging capability[1]
ReliabilityExceptional reliability[1]
Process compatibilityMVD and ALD-capable[1]
Wafer8" compatible[2]
ConfigurationIncludes:[2]
PhasePower Box (415 VAC, 3 Phase)[2]
Station 1Vacuum Cassette Handler (VCH)[2]
Station 2Pre Heat Chamber[2]
Wafer sizeMk1 3 KW lamp (provide wafer heating)[2]
Station 3W Dep Chamber[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]inventory listing