Waferpedia

Comparison ledger

ACS 300 Gen 2versus12-2P-CP

SUSS MicroTec ACS 300 Gen 2, YES 12-2P-CP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
ACS 300 Gen 2SUSS MicroTec
OEMSUSS MicroTecYES
CategoryThermal / DiffusionThermal / Diffusion
Wafer size300mm300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySUSS MicroTec ACS 300YES 12-2P-CP
Cited variants—
Specifications
ConfigurationIncludes:[2]—
Wafer sizeSystem tooling for 200/300 mm semi spec wafer sizes[2]300 mm wafers[1]
OEMSUSS MicroTec[3]—
ModelACS 300 Gen 2[4]—
Equipment typeCoater / Developer[2]—
Automationfully automatic[3]—
Architecturemodular[3]—
Process modesspin-coating and spray-coating[3]—
Integrated functionscoat, bake, and develop modules[2]—
Model designation—12-2P-CP[1]
Series—YES-PB Series / 450PB Series[1]
Load type—manual load[5]
Application scope—MEMS and semiconductor process applications[6]
Cooling package—Air-only cooling package; no water[1]
Airflow—Vertical laminar airflow[1]
High vacuum—10-6[1]
Maximum temperature—up to 450°C[1]
Interface—touch screen interface[6]
Tool type—manual-load high-temperature cure oven[5]
Process applications—MEMS and semiconductor process applications[5]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]inventory listing
  3. [3]web.archive.orgweb.archive.org
  4. [4]Equipment inventory listing
  5. [5]web.archive.orgweb.archive.org
  6. [6]web.archive.orgweb.archive.org