SUSS MicroTec
Gamma Spray alternatives
Comparable Resist Processing equipment documented in the Waferpedia catalog.
6 comparable tools
Headway
1 EC 101 R 485 Photoresist Spinner
Resist Processing
Headway 1 EC 101 R 485 is a photoresist spinner with stated vacuum and electrical requirements.
CEE
100 Spin
Resist Processing
The CEE 100 is a spin coater with a listed power specification of 115 volts and 800 watts.
EV Group
120 Automated Coater Processing
Resist Processing
The EV Group 120 Automated Coater Processing System is an automated coater for 6-inch and 8-inch wafers, built in 2015 and requiring 50/60 Hz, 3-phase, 4-wire plus ground power.
Axcelis
200 PCU Photoresist Stabilizer
Resist Processing
CEE
200 Spin
Resist Processing
The CEE 200 Spin is a spin coater with a 1 phase configuration and support for 8 inch wafers.
TEGAL
211
Resist Processing
The TEGAL 211 is a table top plasma etcher/asher for up to 3-inch wafers with an aluminum chamber.
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