Comparison ledger
SUSS MicroTec Mask, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MaskSUSS MicroTec | 1000FPYES |
|---|---|---|
| OEM | SUSS MicroTec | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec Mask | YES 1000FP |
| Specifications | ||
| Configuration | TXF from OLED[1] | — |
| Model | Mask Cleaner[1] | Glen/YES 1000FP[3] |
| Make | SUSS[1] | — |
| Category | Wet Processing / Clean[1] | — |
| Equipment type | Mask aligner[2] | — |
| Function | Uses UV light to transfer patterns from photomasks onto substrates coated with photoresist[2] | — |
| Exposure modes | Hard contact, soft contact, proximity, flood[2] | — |
| Spectral range | 365nm – 405nm[2] | — |
| Exposure resolution | < 1 µm[2] | — |
| Alignment accuracy | Topside – 500nm[2] | — |
| Substrate accommodation | Wafers up to 6"[2] | — |
| Uniformity | +- 5% over exposure area[2] | — |
| Image capture | CCD camera and monitor[2] | — |
| System type | — | Plasma cleaning system[3] |
| Line | — | R-Series Plasma Cleaning Systems (Glen Technologies)[3] |
| Designed use | — | Designed to accept a range of shelf sizes[3] |
| Application focus | — | Changing needs of the flat panel industry[3] |
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