Waferpedia

Comparison ledger

1512eversusTelius SP 308 Trench

Tegal 1512e, Tokyo Electron Telius SP 308 Trench, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
1512eTegal
Telius SP 308 TrenchTokyo Electron
OEMTegalTokyo Electron
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyTegal 1512eTokyo Electron Telius SP 308 Trench
Specifications
Tool typeIndustrial RIE plasma etcher system[1]Trench etch system[5]
Stated configurationWith modules assembly for CI-4222[1]—
CategoryEtch[2]—
ConditionUsed[3]—
Wafer Sizes—12 inch[4]
Manufacturer—Tokyo Electron[5]
Model—Telius SP 308[4]
Wafer size—12 inch[4]

Plan your fab

Building a Etch process? Get a complete equipment list.

Open the fab equipment planner →
Sources (5)Every fact above is drawn from these public sources
  1. [1]semistarcorp.comsemistarcorp.com
  2. [2]waferpedia.comwaferpedia.com
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]Equipment inventory listing
  5. [5]waferpedia.comwaferpedia.com