Comparison ledger
Tokyo Electron Expedius Plus and Veeco Waferstorm M 3305 Lift Off, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | Expedius PlusTokyo Electron | |
|---|---|---|
| OEM | Tokyo Electron | Veeco |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 2007 Vintage | — |
| Control system | — | — |
| Generation | — | — |
| Family | Tokyo Electron Expedius | Veeco Waferstorm |
| Specifications | ||
| Application | Pre-Diffusion Clean[2] | — |
| Bath-1 | SPM[2] | — |
| Operating | 110 - 150°C, H2SO4/H2O2 (3:1), circulation[2] | — |
| Chemical spiking | auto concentration feedback[2] | — |
| Bath Material | Quartz[2] | — |
| Bath-2 | QDR (hot)[2] | — |
| Megasonic | 950 kHz, 2400W (600*4)[2] | — |
| Bath-3 | APM[2] | — |
| Bath-4 | POU[2] | — |
| Bath-5 | HPM[2] | — |
| Bath-6 | QDR (hot)[2] | — |
| Dryer | SD2[2] | — |
| Configuration | Resistivity monitoring (Horiba)[2] | 300 Series[1] |
| Spin Chuck | — | 150 mm (Centrifugal Edge Grip)[1] |
| Voltage | — | 415 VAC[4] |
| Frequency | — | 50 Hz[4] |
| Phase | — | 3 Phase[4] |
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