Comparison ledger
Zeiss 1540EsB and Zeiss UEM, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | 1540EsBZeiss | UEMZeiss |
|---|---|---|
| OEM | Zeiss | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Zeiss 1540EsB | Zeiss UEM |
| Specifications | ||
| System type | FIB/SEM system[1] | — |
| Electron column | FESEM electron column[1] | — |
| Imaging resolution | resolution approaching the 2 nm range[1] | — |
| Ion column | Ga ion column[1] | — |
| Milling capability | allows for milling (sputtering) of materials from the sample[1] | — |
| Deposition materials | Pt, W, and SiOx[1] | — |
| Gas Injection System etch gases | XeF2 and H2O[1] | — |
| Detector options | multiple detector options for different imaging modes[1] | — |
| Configuration | — | Brightfield[2] |
| Illumination Type | — | Reflected Light[2] |
| Binocular Angle | — | 45°[2] |
| Magnification | — | 8X[2] |
| Magnification Changer | — | 1.25X, 1.6X, 2X[2] |
| Illumination Power | — | 12 V, 60 watts[2] |
| Power Supply included | — | YES[2] |
| Stage Type | — | Coaxial X-Y[2] |
| Length | — | 273 mm (10.78 in)[2] |
| Width | — | 356 mm (14.016 in)[2] |
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