Waferpedia

Comparison ledger

CrossBeam 550 versus LEO 1560

Zeiss CrossBeam 550 and Zeiss LEO 1560, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
OEMZeissZeiss
CategoryMetrology & InspectionMetrology & Inspection
Wafer size6” wafer loading through the loadlock is possible
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control systemWindows
Generation
FamilyZeiss CrossBeam 550Zeiss LEO
Specifications
ColumnGEMINI II electron optical column[1]
Stage5-axes motorized stage (X, Y, Z (M), Tilt and Rotation)[1]
AirlockSemi-automatic airlock[1]
Vibration compensationActive suspensions to compensate for vibrations[1]
Control softwareZeiss SmartSEM software[1]
Control interfaceControlled via a dual joystick and a dedicated control panel; PC with two monitors[1]
DetectorInLens SE detector[1]
Available software for offline analysis and metrologyProSEM software, MountainsMap 8.2 (coupled to 3DSM Metrology), SmartStitch[1]
Reserved useExclusively reserved for imaging dedicated to control of processes done in CMi by regular CMi users[1]
Sample holdersCarousel 9x10mm, multi-pin holder, Wafer Section, 4 Inch Wafer, 6 Inch Wafer, 6 Inch Mask[1]
Configuration6" stage and loadlock[2]
Wafer size6” wafer loading through the loadlock is possible[2]
Known issuesSome Flickering on image of chamber scope[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]epfl.chepfl.ch
  2. [2]inventory listing
  3. [3]inventory listing