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Zeiss

CrossBeam 550

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The Zeiss CrossBeam 550 is a scanning electron microscope (SEM) used for imaging and metrology. The CrossBeam 550 is composed of a GEMINI II column and a 5-axes motorized stage. The CrossBeam 550 detects secondary electrons and backscattered electrons for high-resolution imaging.[1]

Zeiss logo
Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)
  • Plate 01ZEISS Crossbeam 550: Your FIB-SEM for High Throughput 3D Analysis and Sample Preparation

    ZEISS MicroscopyWatch on YouTube
  • Plate 02ISTFA Tools of the Trade 2024: ZEISS Crossbeam 550 Samplefab

    ASM InternationalWatch on YouTube
  • Plate 03Zeiss Crossbeam 550 SEM Basic Training

    Allen HunterWatch on YouTube

Wafer size

6"

Power

20 kV (with beam booster)[1]

Optics

GEMINI II electron optical column[1]

Control era

Windows

What it is

The Zeiss Crossbeam 550 is a FIB-SEM system that combines Gemini 2 SEM imaging with ZEISS Ion-sculptor FIB milling. The Zeiss Crossbeam 550 is positioned for advanced sample preparation and analytics, including 3D tomography, nanofabrication, and TEM lamella preparation.[2]

How it works

The Zeiss Crossbeam 550 pairs Gemini 2 electron optics with an Ion-sculptor FIB column for high-resolution imaging and precise milling. The Zeiss Crossbeam 550 supports live, synchronized imaging during milling, and HDR Mill + SEM is optional. The Zeiss Crossbeam 550 also supports recipe-driven lamella preparation and batch execution through ZEN core EM workflows.[2]

Where it fits in the process flow

General reference — not yet source-verified

A FIB-SEM sits in characterization, failure analysis, and sample-preparation flows rather than in primary patterning or deposition. A machine in this class is typically used after a structure has been fabricated and needs cross-sectional review, defect localization, subsurface access, or specimen thinning for downstream microscopy.

What can it run?

Process applications and technology nodes documented for this tool.

  • Imaging dedicated to process control
  • Offline analysis and metrology
  • High-resolution SE imaging
  • Topography imaging
  • Material contrast imaging
  • Compositional contrast examinations
  • Non-conductive sample imaging
  • Angle-selective material characterization
  • BSE imaging

Why won't it start?

Documented failure modes, common issues, and field considerations.

  • The tool is exclusively reserved for imaging dedicated to process control by regular CMi users.
  • Penalty charges apply for unused booking, late cancellations, and mismatch between booked name and operator name.

What do the numbers mean?

Power & electrical3

Maximum acceleration voltage
20 kV (with beam booster)[1]
Accurate?
SE detector
Everhart-Thornley type detector; collector voltage variable between -250 V and +400 V[1]
Accurate?
Beam booster
Booster voltage always at high potential when acceleration voltage is 20 kV or less[1]
Accurate?

Vacuum & pumping3

Airlock
Semi-automatic airlock for fast specimen transfer and fast pumping times[1]
Accurate?
VPSE detector
Variable Pressure Secondary Electron detector for imaging non-conductive specimens under variable pressure without extensive sample preparation[1]
Accurate?
Available detector
Variable Pressure Secondary Electron (VPSE) detector[1]
Accurate?

Wafer handling7

Sample holders
Carousel 9x10mm, multi-pin holder, Wafer Section, 4 Inch Wafer, 6 Inch Wafer, 6 Inch Mask[1]
Accurate?
Airlock
Semi-automatic airlock for fast and efficient specimen transfer[1]
Accurate?
Specimen holders
Carousel 9x10mm, multi-pin holder, Wafer Section, 4 Inch Wafer, 6 Inch Wafer, 6 Inch Mask[1]
Accurate?
Specimen transfer
Semi-automatic airlock for fast specimen transfer[1]
Accurate?
Sample holders
Carousel 9x10mm, multi-pin holder, wafer section (cleaved samples), 4 inch wafer, 6 inch wafer, 6 inch mask[1]
Accurate?
Specimen holders
Carousel 9x10mm, multi-pin holder, wafer section (cleaved samples), 4 inch wafer, 6 inch wafer, 6 inch mask[1]
Accurate?
Available holder
6 Inch Wafer[1]
Accurate?

Optics & imaging15

Column
GEMINI II electron optical column[1]
Accurate?
Detector
InLens SE detector[1]
Accurate?
Detector
SE detector[1]
Accurate?
Detector
EsB detector[1]
Accurate?
Detector
aBSD detector[1]
Accurate?
Detector
VPSE detector[1]
Accurate?
Column type
GEMINI II[1]
Accurate?
Detectors
InLens SE, SE (Everhart-Thornley), EsB, aBSD, VPSE[1]
Accurate?
Detectors
InLens SE Detector, SE Detector (Everhart-Thornley type), EsB Detector, aBSD Detector (annular BackScattered electron detector), VPSE Detector[1]
Accurate?
Detectors
InLens SE, SE (Everhart-Thornley), EsB, aBSD and VPSE detectors[1]
Accurate?
Electron optical column
GEMINI II[1]
Accurate?
aBSD detector
Pneumatically retractable annular backscattered electron detector with five separate diode segments (one inner concentric ring, four outer quadrants)[1]
Accurate?
EsB detector
Energy-selective backscattered detector enabling SE and BSE detection; annular shaped in-column detector located above the InLens SE detector[1]
Accurate?
Chamber cameras
Chamber CCD camera at backside plus a second CCD camera on the left-hand side of the specimen chamber[1]
Accurate?
Available detector
aBSD detector[1]
Accurate?

Control & software9

Control software
Zeiss SmartSEM software[1]
Accurate?
Control interface
Controlled via a dual joystick and a dedicated control panel; PC with two monitors[1]
Accurate?
Available software for offline analysis and metrology
ProSEM software, MountainsMap 8.2 (coupled to 3DSM Metrology), SmartStitch[1]
Accurate?
Reserved use
Exclusively reserved for imaging dedicated to control of processes done in CMi by regular CMi users[1]
Accurate?
Software
Zeiss SmartSEM[1]
Accurate?
Control
Dual joystick and control panel[1]
Accurate?
Control software
Zeiss SmartSEM software operated via graphical user interface[1]
Accurate?
Control interface
Dual joystick for stage control and specimen navigation, plus main keyboard control panel for direct access to 14 frequently used functions[1]
Accurate?
Software
Zeiss SmartSEM control software; offline analysis and metrology with ProSEM, MountainsMap 8.2 (coupled to 3DSM Metrology), SmartStitch; automated metrology via InSPEC[1]
Accurate?

Configuration & options16

Stage
5-axes motorized stage (X, Y, Z (M), Tilt and Rotation)[1]
Accurate?
Airlock
Semi-automatic airlock[1]
Accurate?
Vibration compensation
Active suspensions to compensate for vibrations[1]
Accurate?
Electron source
Schottky field emitter[1]
Accurate?
Stage
5-axis motorized (X, Y, Z, tilt, rotation)[1]
Accurate?
Airlock
Semi-automatic[1]
Accurate?
Active suspension
Yes, for vibration compensation[1]
Accurate?
Stage axes
X, Y, Z (M), Tilt, Rotation[1]
Accurate?
Beam booster
Yes, up to 20 kV[1]
Accurate?
Monitors
Two monitors[1]
Accurate?
Gun type
Schottky field emitter[1]
Accurate?
Electron gun
Schottky field emitter[1]
Accurate?
Stage
5-axes motorized eucentric stage (X, Y, Z (M), Tilt and Rotation)[1]
Accurate?
Vibration compensation
Active suspensions (always activated)[1]
Accurate?
Stage
5-axes motorized eucentric stage (X, Y, Z (M), Tilt, Rotation)[1]
Accurate?
Vibration isolation
Set of active suspensions for vibration compensation (always activated)[1]
Accurate?

Vintage & configurations

Control-system eraWindows[1]

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What replaced it?

  • siblingZeiss Merlin— The basic training notes differences between the SEM Crossbeam and SEM MERLIN, and state that being fully trained on SEM MERLIN is a prerequisite.source[1]

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Maximum acceleration voltage20 kV (with beam booster)[1]
  • AirlockSemi-automatic airlock for fast specimen transfer and fast pumping times[1]
  • VPSE detectorVariable Pressure Secondary Electron detector for imaging non-conductive specimens under variable pressure without extensive sample preparation[1]
  • SE detectorEverhart-Thornley type detector; collector voltage variable between -250 V and +400 V[1]
  • Beam boosterBooster voltage always at high potential when acceleration voltage is 20 kV or less[1]
  • Available detectorVariable Pressure Secondary Electron (VPSE) detector[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

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Frequently asked questions

What type of instrument is the Zeiss Crossbeam 550?

The Zeiss Crossbeam 550 is a FIB-SEM system that combines Gemini 2 SEM imaging with ZEISS Ion-sculptor FIB milling.[2]

Does the Zeiss Crossbeam 550 support live imaging during milling?

The Zeiss Crossbeam 550 allows live, synchronized imaging during milling so that structures can be monitored as material is removed. HDR Mill + SEM is optional.[2]

What lamella-preparation steps does the Zeiss Crossbeam 550 support?

The Zeiss Crossbeam 550 supports chunking, thinning, lift-out, and on-grid attachment in integrated TEM lamella preparation workflows.[2]

Not publicly documented

The following facts about the CrossBeam 550 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the CrossBeam 550 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the CrossBeam 550 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The process node or technology generation of the CrossBeam 550 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the CrossBeam 550 are on record.

    Answerable by: an OEM parts catalog or a service engineer

  • No publicly hosted manuals, SOPs, or datasheets for the CrossBeam 550 are on record.

    Answerable by: university cleanroom staff or an OEM application specialist

Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]epfl.ch — epfl.chepfl.ch
  2. [2]ZEISS Crossbeam 550 FIB-SEM | Advanced Sample Preparation — zeiss.comzeiss.com
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Last updated Oct 20, 2026.

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