Comparison ledger
Zeiss CrossBeam 550 and Zeiss Orion NanoFab, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | CrossBeam 550Zeiss | Orion NanoFabZeiss |
|---|---|---|
| OEM | Zeiss | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | Windows | — |
| Generation | — | — |
| Family | Zeiss CrossBeam 550 | Zeiss Orion NanoFab |
| Specifications | ||
| Column | GEMINI II electron optical column[1] | — |
| Stage | 5-axes motorized stage (X, Y, Z (M), Tilt and Rotation)[1] | — |
| Airlock | Semi-automatic airlock[1] | — |
| Vibration compensation | Active suspensions to compensate for vibrations[1] | — |
| Control software | Zeiss SmartSEM software[1] | — |
| Control interface | Controlled via a dual joystick and a dedicated control panel; PC with two monitors[1] | — |
| Detector | InLens SE detector[1] | — |
| Available software for offline analysis and metrology | ProSEM software, MountainsMap 8.2 (coupled to 3DSM Metrology), SmartStitch[1] | — |
| Reserved use | Exclusively reserved for imaging dedicated to control of processes done in CMi by regular CMi users[1] | — |
| Sample holders | Carousel 9x10mm, multi-pin holder, Wafer Section, 4 Inch Wafer, 6 Inch Wafer, 6 Inch Mask[1] | — |
| Instrument type | — | Focused ion beam (FIB) microscope[2] |
| Functions | — | Ultrahigh-resolution imaging, direct writing, and lithography platform[2] |
| Beam species | — | Operates with either He or Ne[2] |
| He beam probe | — | ~0.5 nm[2] |
| He beam imaging performance | — | Produces sub-5 nm resolution images and patterns with large depth of field[2] |
| Ne beam application range | — | Direct write and lithography applications between 10 and 100 nm[2] |
| Sample capability | — | Non-conductive samples can be imaged with the aid of an electron flood gun[2] |
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