Waferpedia

Zeiss

Orion NanoFab

Zeiss logo
Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

What it is

The Zeiss ORION NanoFab is a focused ion beam microscope used as an ultrahigh-resolution imaging, direct writing, and lithography platform.[1]

It operates with either helium or neon and includes an electron flood gun for imaging non-conductive samples.[1]

How it works

The instrument uses a helium beam for high-resolution imaging and patterning, with a probe size of about 0.5 nm and sub-5 nm resolution images and patterns with large depth of field.[1]

The neon beam is used for direct write and lithography applications in the 10 to 100 nm range.[1]

Applications

Stated applications include ultrahigh-resolution imaging, direct writing, lithography, and imaging of non-conductive samples with the aid of an electron flood gun.[1]

  • Imaging
  • Direct writing
  • Lithography

What do the numbers mean?

Optics & imaging4

Functions
Ultrahigh-resolution imaging, direct writing, and lithography platform[1]
Accurate?
He beam probe
~0.5 nm[1]
Accurate?
He beam imaging performance
Produces sub-5 nm resolution images and patterns with large depth of field[1]
Accurate?
Ne beam application range
Direct write and lithography applications between 10 and 100 nm[1]
Accurate?

Configuration & options3

Instrument type
Focused ion beam (FIB) microscope[1]
Accurate?
Beam species
Operates with either He or Ne[1]
Accurate?
Sample capability
Non-conductive samples can be imaged with the aid of an electron flood gun[1]
Accurate?
Interested in this tool?
Embed spec card

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Frequently asked questions

What type of instrument is the Zeiss ORION NanoFab?

It is a focused ion beam microscope used as an ultrahigh-resolution imaging, direct writing, and lithography platform.[1]

What beams does it use?

It operates with either helium or neon.[1]

What is the helium beam used for?

The helium beam is used for ultrahigh-resolution imaging and patterning, with a probe of about 0.5 nm and sub-5 nm resolution images and patterns with large depth of field.[1]

What is the neon beam used for?

The neon beam is used for direct write and lithography applications between 10 and 100 nm.[1]

Can non-conductive samples be imaged?

Yes. Non-conductive samples can be imaged with the aid of an electron flood gun.[1]

Not publicly documented

The following facts about the Orion NanoFab are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Orion NanoFab are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Orion NanoFab are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Orion NanoFab are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Orion NanoFab are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Orion NanoFab is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]nano.upenn.edunano.upenn.edunano.upenn.edu
Was this page accurate?

Last updated Jul 24, 2026.

Compare with similar tools

View all →