Comparison ledger
Zeiss Orion NanoFab and Zeiss Supra 55, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | Orion NanoFabZeiss | Supra 55Zeiss |
|---|---|---|
| OEM | Zeiss | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Zeiss Orion NanoFab | Zeiss Supra 55 |
| Cited variants | — | |
| Specifications | ||
| Instrument type | Focused ion beam (FIB) microscope[3] | — |
| Functions | Ultrahigh-resolution imaging, direct writing, and lithography platform[3] | — |
| Beam species | Operates with either He or Ne[3] | — |
| He beam probe | ~0.5 nm[3] | — |
| He beam imaging performance | Produces sub-5 nm resolution images and patterns with large depth of field[3] | — |
| Ne beam application range | Direct write and lithography applications between 10 and 100 nm[3] | — |
| Sample capability | Non-conductive samples can be imaged with the aid of an electron flood gun[3] | — |
| Configuration | — | Detectors:[4] |
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