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Comparison ledger

ATC 1500 FversusATC 2036 E

AJA ATC 1500 F, AJA ATC 2036 E, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMAJAAJA
CategoryDepositionDeposition
Wafer size—15-20” adjustable length from source to wafer
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAJA ATCAJA ATC
Cited variants—
  • ATC 2030-E HV[1]
  • ATC 2036-E HV[1]
Specifications
ConfigurationSubstrate size up to 3”[2]Temescal Multu-Pocket Rotary E-Beam Source[4]
Tool typesputter coater[2]—
CategoryDeposition[3]Deposition[5]
Substrate sizeup to 3 inches[2]—
Targets4[2]—
Power supplyKurt J Lesker R301 RF Power Supply[2]—
Vacuum gauge controllerGranville-Phillips Series 307 Vacuum Gauge Controller[3]—
Matching network controllerSEREN MC2 Matching Network Controller[2]—
Magnetron driveAdvanced Energy MDX500 Magnetron Drive (2x)[2]—
Automatic matching networkSEREN AT-3 Automatic Matching network[2]—
Pump controllerPfeiffer pump controller DCU (2x)[2]—
Vacuum pumpsnot included[2]—
Magnetic manipulatorincluded[2]—
Wafer size—15-20” adjustable length from source to wafer[4]
Chamber Front—Double hinged door with locking mechanism[4]
Model—ATC 2036 E[4]
Source-to-wafer length—15-20 inch adjustable[5]
Evaporation source—Temescal Multu-Pocket Rotary E-Beam Source[4]
Deposition controller—Quartz Crystal Deposition Controller[4]
Substrate holder—Water Cooled Substrate Holder[4]
Load-lock—Load-Lock[4]
Chamber dimensions—Nominal 36" high x 20" depth x 20" wide[4]
Chamber construction—Flat front; S/S vacuum chamber[4]
Vacuum gauge package—Vacuum Gauge Package with Cables[4]
Vacuum pumping—Brooks Cryo-Torr 8 straight cryo-pump with compressor (Model: 8200, water cooled); 16 cfm Pfeiffer (Adixen / ACP) dry, lobe type backing pump with fast acting inlet valve; AJA automated pumping system controlled and displayed via Touch Screen Controller[4]
Source type—6 pocket rotary e-beam source[1]
Substrate heating—1000°C substrate heating[1]
Substrate shutter—Programmable linear substrate shutter for wedge films[1]
Spare—16 cfm Pfeiffer (Adixen / ACP) Dry, lobe type backing pump with fast acting inlet valve for power failure[4]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]inventory listing
  5. [5]waferpedia.comwaferpedia.com