Comparison ledger
Applied Materials 0010 47763, Lam Research Alliance 4400, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | Alliance 4400Lam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 1995 Vintage |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Lam Research Alliance |
| Specifications | ||
| Configuration | 2nd Source New[1] | 2 chamber and Controller[7] |
| Type | Monopolar Dual Heated[2] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | Alliance 4400[7] |
| OEM | Applied Materials[1] | Lam Research[7] |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | — |
| Quantity available (source) | 1[2] | — |
| Part number | 0010-47763[2] | — |
| Component type | Electrostatic chuck (ESC) assembly[4] | — |
| Designation | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Wafer size reference | 300 mm[5] | — |
| Associated part number | 0041-39086[6] | — |
| Configuration (Asset #127688) | — | 2 chamber and Controller[7] |
| Controller Rack (Asset #127688) | — | Missing[7] |
| Configuration (Asset #127686) | — | 2 Chamber Set and Controller[8] |
| Completeness (Asset #127686) | — | Not a complete set (chamber only)[8] |
| Vintage (Asset #127686) | — | 1995[8] |
| Chamber listing | — | 2 Chamber Set and Controller[8] |
| Completeness note | — | Not a complete set (chamber only)[8] |
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