Comparison ledger
Applied Materials 0010 47763, Tokyo Electron Tactras RLSA, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | Tactras RLSATokyo Electron |
|---|---|---|
| OEM | Applied Materials | Tokyo Electron |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Tokyo Electron Tactras RLSA |
| Specifications | ||
| Configuration | 2nd Source New[1] | Oxide, Nitride, Polysilicon[4] |
| Type | Monopolar Dual Heated[2] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | — |
| OEM | Applied Materials[1] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | — |
| Quantity available (source) | 1[2] | — |
| Chamber Type | — | Polysilicon Dry Etch Chamber[5] |
| Wafer Size | — | 300mm[6] |
| Microwave Generator | — | Nihon Koshuha Microwave Generator, Model MKS 050B04C-OSC-V[7] |
| Turbo Pump | — | SHIMADZU FT2301D[7] |
| Top Generator | — | MKS-050B04 PS-V[7] |
| Bottom Generator | — | Daihen RGA-20C[7] |
| Gas Box Configuration | — | N2, TSA, Ar, H2, NF3, SiH4[7] |
| Chuck | — | ESC with Dual He Cooling[7] |
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