Tokyo Electron

Tactras RLSA

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Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

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What it is

General reference — not yet source-verified

The Tactras RLSA is a plasma etching system used in semiconductor manufacturing for dry etching of thin films. The system employs a microwave plasma source to achieve anisotropic etching with high selectivity.

How it works

General reference — not yet source-verified

Plasma etching systems use a radio frequency or microwave source to generate a plasma from process gases inside a vacuum chamber. The plasma contains ions, radicals, and electrons that chemically react with and physically bombard the wafer surface, removing material in a directional manner. The wafer is held on an electrostatic chuck that provides temperature control.

What do the numbers mean?

Configuration & options1

Oxide, Nitride, Polysilicon^[1]

Accurate?

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Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What wafer size does the system support?

The system is configured for 300 mm wafers.^[2]^[3]^[4]^[5]^[6]

What types of films can it etch?

The system can etch oxide, nitride, and polysilicon films.^[1]^[2]^[6]

What are the key chamber components?

Key components include an electrostatic chuck with dual helium cooling, a Nihon Koshuha microwave generator (model MKS 050B04C-OSC-V), and a Shimadzu turbo pump (model FT2301D).^[3]^[4]^[5]

Not publicly documented

The following facts about the Tactras RLSA are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

Fewer than 3 independently cited specifications for the Tactras RLSA are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Tactras RLSA are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Tactras RLSA are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Tactras RLSA are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Tactras RLSA are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician

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Sources & citations

Sources (6)Every fact above is drawn from these public sources

[1]inventory listing
[2]Etch/Ash/Clean - Plasma Processing | Polysilicon Etch | Macquarie Group — macquarie.commacquarie.com
[3]https://www.solutions-on-silicon.com/web/content/178846?unique=6f45eedca4cd075efd2033d7695d32ec04861e06&download=true — solutions-on-silicon.comsolutions-on-silicon.com
[4]TEL, Tokyo Electron Tactras RLSA (Chamber) — wotol.comwotol.com
[5]TEL Tokyo Electron Tactras RLSA (Chamber) Polysilicon Dry Etch Chamber for sale — fabsurplus.comfabsurplus.com
[6]东京电子 TEL Tactras RLSA ETC 半导体干法刻蚀机架，半导体机架，零部件制造-刻蚀设备-上海梓鹤机械设备有限公司-精密钣金、CNC加工、喷涂、半导体机架、半导体气柜、半导体设备、半导体柜壳、半导体零部件加工！ — zihejx.comzihejx.com