Comparison ledger
Applied Materials Centura AP AdvantEdge G 5 Dry, Tegal 110, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Centura AP AdvantEdge G 5 DryApplied Materials | 110Tegal |
|---|---|---|
| OEM | Applied Materials | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials Centura | Tegal 110 |
| Cited variants | — |
|
| Specifications | ||
| Phase | 3 Phase[2] | — |
| Configuration | 3 Wire + G Line[2] | — |
| Chamber A Chemicals Gases Used | BCl3, Cl2, SO2, NF3, CH2F2, HBr, O2, N2, CF4, He, CHF3, SF6, Ar[2] | — |
| Chamber B Chemicals Gases Used | BCl3, Cl2, SO2, NF3, CH2F2, HBr, O2, N2, CF4, He, CHF3, SF6, Ar[2] | — |
| Chamber D Chemicals Gases Used | N2, O2, CF4[2] | — |
| OEM | Applied Materials[2] | — |
| Model | Centura AP AdvantEdge G 5[2] | — |
| Equipment type | Dry Etcher[2] | — |
| Electrical | 3 Phase - 3 Wire[2] | — |
| Line | G Line[2] | — |
| Frequency | 50/60 Hz[2] | — |
| Loadport | Standard Loadport[2] | — |
| Control system | Server GEM II[2] | — |
| Chamber A gases | BCl3, Cl2, SO2, NF3, CH2F2, HBr, O2, N2, CF4, He, CHF3, SF6, Ar[2] | — |
| Chamber B gases | BCl3, Cl2, SO2, NF3, CH2F2, HBr, O2, N2, CF4, He, CHF3, SF6, Ar[2] | — |
| Chamber D gases | N2, O2, CF4[2] | — |
| HDD | No HDD[2] | — |
| Vintage | 2013[2] | — |
| model | — | 110 SE[1] |
| application focus | — | process development applications[1] |
| process capability | — | deep silicon plasma etching[1] |
| capabilities | — | very high aspect ratio trench etch and profile control[1] |
| configuration | — | multiple configurations with minimum technical intervention[1] |
| System type | — | plasma etch system[3] |
| Supported components | — | MEMS and 3D-IC components[1] |
| Control capability | — | very high aspect ratio trench etch and profile control[3] |
| Physical description | — | compact[1] |
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