Comparison ledger
Canon FPA 2500 i 3, EV Group 101, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FPA 2500 i 3Canon | 101EV Group |
|---|---|---|
| OEM | Canon | EV Group |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 2500 | EV Group 101 |
| Specifications | ||
| Configuration | Some problems of alignment repeatability not stable (can be fixed by FSE)[1] | — |
| Manufacturer | Canon[1] | — |
| Model | FPA 2500 i 3[1] | 101[4] |
| Equipment type | Stepper[2] | — |
| Category | Lithography[2] | — |
| Wafer size | 8 inch[1] | — |
| Reticle size | 5 inch[3] | — |
| Manufacture year | 1993[3] | — |
| Wafer type | Notch[3] | — |
| Chuck type | Ring[3] | — |
| Auto feed | Left hand[3] | — |
| Track interface | Yes[3] | — |
| Software version | VS 5.26 BW[3] | — |
| Performance metric | IUC Uniformity NA/Sigma mode (54/60) 517[3] | — |
| Known issue | Some problems of alignment repeatability not stable (can be fixed by FSE)[2] | — |
| OEM | — | EV Group[4] |
| Equipment name | — | EVG 101 Spray Coater[4] |
| NEMO ID | — | evgspraycoat[4] |
| Training required | — | EVG 101 Training[4] |
| Training duration | — | 1.50 hours[4] |
| Processing technique | — | Resist Spray Coat (manual)[4] |
| Cleanliness | — | "All"[4] |
| Location | — | SNF Paul G Allen L107 Cleanroom[4] |
| Wafer diameter (substrate size) | — | up to 300 mm[5] |
| Available modules | — | Spin coat / OmniSpray® / develop[5] |
| Wafer handling options | — | Bowed / warped / thin wafer handling, edge handling[5] |
| Dispense options | — | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[5] |
| Processing technique (at SNF) | — | Resist Spray Coat (manual)[6] |
| Cleanliness group (at SNF) | — | "All"[4] |
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