Comparison ledger
CEE 100, SUSS MicroTec MA 200 Automatic Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100CEE | MA 200 Automatic MaskSUSS MicroTec |
|---|---|---|
| OEM | CEE | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | 6" | Capable of working with wafer masks up to 9″ x 9″ |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | SUSS MicroTec MA 200 |
| Cited variants |
| — |
| Specifications | ||
| Tool type | Spray Developer[1] | — |
| Accepts wafer size | up to 6" wafers[2] | — |
| Programmable programs | 10 programs[2] | — |
| Steps per program | up to 10 steps[2] | — |
| Programmable step parameters | Acceleration, Speed, Time[2] | — |
| Associated document | CEE Model 100CB Spinner.doc[2] | — |
| Wafer size | Up to 6 inches[2] | Capable of working with wafer masks up to 9″ x 9″[4] |
| Programs | 10 programs each with up to 10 steps[2] | — |
| Control parameters | Acceleration, Speed, Time[2] | — |
| Equipment type | Spin coater[3] | — |
| Programming | 10 programs; up to 10 steps per program[2] | — |
| Step parameters | Acceleration, speed, time[2] | — |
| Configuration | — | Configured for top side alignment[4] |
| OEM | — | SUSS MicroTec[5] |
| Category | — | Lithography[5] |
| Alignment configuration | — | Configured for top side alignment[4] |
| Lamp house | — | 1000 watt lamp house[4] |
| Lamp power supply unit | — | CIC 1000 LH 1000[4] |
| Optic | — | UV 400 Optic (for 365nm & 405nm)[4] |
| Lamp adapter | — | Lamp adapter LH1000/HBO MA8/MA200[4] |
| Light sensor | — | Suss 2 Channel light sensor 365/405nm[4] |
| Auto alignment system | — | AL 3000 Auto alignment system[4] |
| Microscope | — | DVM8 microscope with motorized objective movement with field expanders[4] |
| Objective | — | Objective 20x Olympus UMPL FL 20 X – working distance 12mm[4] |
| Pre-aligner | — | XRS pre aligner[4] |
| Mask holder | — | Large clear field proximity mask holder for 9″ corner marks, with 8″ exposure area[4] |
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