Comparison ledger
CEE 200 Spin, SCREEN SK 80 BW-AVPE, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 SpinCEE | SK 80 BW-AVPESCREEN |
|---|---|---|
| OEM | CEE | SCREEN |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | Wafer Transfer Robot x 1 (1 Block System) |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 200 | SCREEN SK 80 |
| Specifications | ||
| Phase | 1 Phase[1] | — |
| Type | Spin Coater[1] | — |
| Model | 200[1] | SK 80 BW-AVPE[3] |
| Make | CEE[1] | — |
| Wafer Sizes | 8 inch[1] | — |
| Configuration | 1 Phase[1] | 4 Cassette Loading Port[3] |
| Equipment type | Spin Coater[1] | Coater / Developer[3] |
| Spin speed | 5000 rpm[2] | — |
| Substrate support | Flat substrates up to 200 mm or fragments[2] | — |
| Substrate thickness max | 12 mm[2] | — |
| Coating thickness | Uniform coating thickness up to 100 µm[2] | — |
| Process | — | Photo[3] |
| Cassette Index Station | — | 4 Side Loading[3] |
| Wafer size | — | Wafer Transfer Robot x 1 (1 Block System)[3] |
| PR Resist Pump | — | Iwaki Bellows Pump 4 Set Per 1 Spin Unit[3] |
| Wafer Flow Direction | — | Right to Left[3] |
| Voltage | — | 100V, 3.5 kW[4] |
| Main Body | — | CCD, ETU, TCU, Power Unit (USA)[4] |
| OEM | — | SCREEN / DNS[3] |
| Cassette loading port | — | 4 cassette loading port[3] |
| Layout | — | 2 coater & 2 developer layout[3] |
| Wafer transfer | — | Wafer Transfer Robot x 1 (1 Block System)[3] |
| Main body components | — | CCD, ETU, TCU, Power (USA)[3] |
| Power | — | 100V, 3.5 kW; 208V, 9.4 kW; 208V, 8.4 kW[4] |
| Vintage | — | 1995[3] |
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