Comparison ledger
CEE 200 Spin, Tokyo Electron Act 12 DUV Photoresist Coater Developer Track, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 SpinCEE | Act 12 DUV Photoresist Coater Developer TrackTokyo Electron |
|---|---|---|
| OEM | CEE | Tokyo Electron |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | The direction of wafer flow is right to left |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 200 | Tokyo Electron Act 12 |
| Specifications | ||
| Phase | 1 Phase[1] | — |
| Type | Spin Coater[1] | — |
| Model | 200[1] | Act 12 DUV Photoresist Coater / Developer Track[3] |
| Make | CEE[1] | — |
| Wafer Sizes | 8 inch[1] | — |
| Configuration | 1 Phase[1] | Type 4 Main controller[3] |
| Equipment type | Spin Coater[1] | — |
| Spin speed | 5000 rpm[2] | — |
| Substrate support | Flat substrates up to 200 mm or fragments[2] | — |
| Substrate thickness max | 12 mm[2] | — |
| Coating thickness | Uniform coating thickness up to 100 µm[2] | — |
| Wafer size | — | The direction of wafer flow is right to left[3] |
| OEM | — | Tokyo Electron[3] |
| Category | — | Resist Processing[3] |
| Wafer flow direction | — | right to left[3] |
| Main controller | — | Type 4[3] |
| Load ports | — | 4 FOUP load ports for 12 inch wafers[3] |
| COT units | — | 2[3] |
| BARC units | — | 2[3] |
| DEV units | — | 4[3] |
| WEE unit | — | 1[3] |
| ADH units | — | 2[3] |
| Closed loop T&H system | — | Included[3] |
| IFB | — | for wafer transport system NIKON NSR-S204B[3] |
| Vintage | — | 2009[3] |
| Manufacturer | — | TEL Tokyo Electron[4] |
| Description | — | Photoresist Coater and Developer Track[4] |
| Technology | — | Deep Ultraviolet (DUV)[3] |
| Wafer setup | — | 300mm – 12inch wafer setup[3] |
| Process units | — | 2 COT units, 2 BARC units, 4 DEV units, 1 WEE unit, 2 ADH units[3] |
| Transport interface | — | IFB for wafer transport system NIKON NSR-S204B[3] |
| Chemical cabinets | — | Chemical Cabinet 1, Chemical Cabinet 2, Chemical Cabinet 3[3] |
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