Waferpedia

Tokyo Electron

Act 12 DUV Photoresist Coater Developer Track

Act 12 DUV Photoresist Coater Developer Track — Inventory photo
Fig. 01Act 12 DUV Photoresist Coater Developer TrackInventory photo[1]

Wafer size

The direction of wafer flow is right to left

Gas delivery

Chemical Cabinet 1[1]

What is it?

Tokyo Electron Act 12 DUV Photoresist Coater / Developer Track is a deep ultraviolet wafer-processing system with a right-to-left wafer flow and 300mm wafer setup.

Why won't it start?

Documented failure modes, common issues, and field considerations.

  • Temp. Cont. Unit / system leaky and deactivated
  • T&H chamber requires service
  • Resist pump status unclear
  • 1 FOUP load port defective
  • IRA Z driver missing
  • WEE unit defective

What do the numbers mean?

Wafer handling4

Wafer size
The direction of wafer flow is right to left[1]
Accurate?
Wafer size
300mm – 12inch wafer setup[1]
Accurate?
4 FOUP load ports for 12” wafers[1]
Accurate?
Wafer size
IFB for wafer transport system NIKON NSR-S204B[1]
Accurate?

Gas & chemistry5

Dispense Monitoring system on all 24 resist lines[1]
Accurate?
Aut- air vent function on all resist LE tanks[1]
Accurate?
Chemical Cabinet 1[1]
Accurate?
Chemical Cabinet 2[1]
Accurate?
Chemical Cabinet 3[1]
Accurate?

Control & software2

Type 4 Main controller[1]
Accurate?
Several Software Options[1]
Accurate?

Configuration & options9

Dual Block[1]
Accurate?
2 COT units[1]
Accurate?
2 BARC units[1]
Accurate?
4 DEV units[1]
Accurate?
1 WEE unit[1]
Accurate?
2 ADH units[1]
Accurate?
Closed Loop T&H System[1]
Accurate?
AC Power Box[1]
Accurate?
Temp. Cont. Unit SMC[1]
Accurate?
Interested in this tool?
Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationDispense Monitoring system on all 24 resist lines[1]
  • ConfigurationAut- air vent function on all resist LE tanks[1]
  • ConfigurationChemical Cabinet 1[1]
  • ConfigurationChemical Cabinet 2[1]
  • ConfigurationChemical Cabinet 3[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the Act 12 DUV Photoresist Coater Developer Track are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Act 12 DUV Photoresist Coater Developer Track are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Act 12 DUV Photoresist Coater Developer Track are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Act 12 DUV Photoresist Coater Developer Track are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • The process node or technology generation of the Act 12 DUV Photoresist Coater Developer Track is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the Act 12 DUV Photoresist Coater Developer Track are on record.

    Answerable by: an OEM parts catalog or a service engineer

Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]Inventory photo
Was this page accurate?

Last updated Jul 29, 2026.

Compare with similar tools

View all →