Comparison ledger
CEE 200 Spin, Veeco 3303 Lift Off, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 SpinCEE | 3303 Lift OffVeeco |
|---|---|---|
| OEM | CEE | Veeco |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 200 | Veeco 33xx |
| Specifications | ||
| Phase | 1 Phase[1] | — |
| Type | Spin Coater[1] | — |
| Model | 200[1] | 3303[3] |
| Make | CEE[1] | — |
| Wafer Sizes | 8 inch[1] | — |
| Configuration | 1 Phase[1] | HVS (High Velocity Spray) Chamber up to 40 PSI[3] |
| Equipment type | Spin Coater[1] | — |
| Spin speed | 5000 rpm[2] | — |
| Substrate support | Flat substrates up to 200 mm or fragments[2] | — |
| Substrate thickness max | 12 mm[2] | — |
| Coating thickness | Uniform coating thickness up to 100 µm[2] | — |
| HPC solvent lift off process | — | 500-2300 PSI1)[3] |
| Machine type | — | Lift Off Machine[4] |
| Wafer size | — | 6 inch[3] |
| Process | — | HPC solvent lift off process[3] |
| Process pressure | — | 500-2300 PSI[3] |
| Chamber pressure | — | up to 40 PSI[4] |
| OEM | — | Veeco / SSEC[3] |
| HVS chamber pressure | — | up to 40 PSI[3] |
| Vintage | — | 2006[3] |
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