Comparison ledger
EV Group 101, Nikon S 204 B, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | S 204 BNikon |
|---|---|---|
| OEM | EV Group | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 2002– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | Nikon S 204 B |
| Specifications | ||
| OEM | EV Group[1] | Nikon[4] |
| Model | 101[1] | S 204 B[4] |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Machine designation | — | NSR-S204B[5] |
| Equipment type | — | Stepper[4] |
| Exposure wavelength | — | 248nm[6] |
| Laser type | — | KrF excimer laser[6] |
| Reduction ratio | — | 4:1[6] |
| NA | — | 0.68 (max)[6] |
| Wafer size | — | 300mm[6] |
| Reticle size | — | 6"[6] |
| Field size | — | 25 x 33 mm2[6] |
| Manufactured | — | June 2002[6] |
| Category | — | Lithography[6] |
| System designation | — | NSR-S204B[5] |
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