Comparison ledger
EV Group 101, Quintel Q 4000 Series Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | Q 4000 Series MaskQuintel |
|---|---|---|
| OEM | EV Group | Quintel |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | Quintel Q 4000 Series Mask |
| Specifications | ||
| OEM | EV Group[1] | — |
| Model | 101[1] | Q 4000 Series[4] |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Configuration | — | Illumination Controller[4] |
| Make | — | Quintel[4] |
| Tool type | — | Mask Aligner[4] |
| Printing modes | — | Vacuum and contact printing[5] |
| Substrate size | — | up to 100mm (4") diameter[5] |
| Mask size | — | 4" or 5"[5] |
| Alignment stage | — | Manual X-Y joystick and micrometer theta alignment stage[5] |
| Print resolution | — | 1 micron (with vacuum mode)[5] |
| Viewing system | — | VideoView CCTV splitfield/singlefield microscope with zoom[5] |
| Backside alignment | — | IR capability[5] |
| Exposure wavelengths | — | 365 nm (Channel A), 405 nm (Channel B)[6] |
| Gap spacing | — | 30 µm[6] |
| Lamp intensity unit | — | mW/cm²[6] |
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