Comparison ledger
EV Group 101, SUSS MicroTec MA 200 Automatic Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | MA 200 Automatic MaskSUSS MicroTec |
|---|---|---|
| OEM | EV Group | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | Capable of working with wafer masks up to 9″ x 9″ |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | SUSS MicroTec MA 200 |
| Specifications | ||
| OEM | EV Group[1] | SUSS MicroTec[5] |
| Model | 101[1] | — |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Wafer size | — | Capable of working with wafer masks up to 9″ x 9″[4] |
| Configuration | — | Configured for top side alignment[4] |
| Category | — | Lithography[5] |
| Alignment configuration | — | Configured for top side alignment[4] |
| Lamp house | — | 1000 watt lamp house[4] |
| Lamp power supply unit | — | CIC 1000 LH 1000[4] |
| Optic | — | UV 400 Optic (for 365nm & 405nm)[4] |
| Lamp adapter | — | Lamp adapter LH1000/HBO MA8/MA200[4] |
| Light sensor | — | Suss 2 Channel light sensor 365/405nm[4] |
| Auto alignment system | — | AL 3000 Auto alignment system[4] |
| Microscope | — | DVM8 microscope with motorized objective movement with field expanders[4] |
| Objective | — | Objective 20x Olympus UMPL FL 20 X – working distance 12mm[4] |
| Pre-aligner | — | XRS pre aligner[4] |
| Mask holder | — | Large clear field proximity mask holder for 9″ corner marks, with 8″ exposure area[4] |
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