Comparison ledger
EV Group 101, SUSS MicroTec MA 200 CC Exposure, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | MA 200 CC ExposureSUSS MicroTec |
|---|---|---|
| OEM | EV Group | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | SUSS MicroTec MA 200 |
| Specifications | ||
| OEM | EV Group[1] | SUSS MicroTec[5] |
| Model | 101[1] | MA 200 CC[5] |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Configuration | — | Damaged or Shortage:[4] |
| Tool type | — | Lithography exposure tool[5] |
| Alignment mode | — | Top-side alignment[6] |
| Operation mode | — | Cassette to cassette operation[6] |
| Wafer capability | — | Up to 8"/200mm wafer capable[6] |
| Lamp house | — | 1000 Watt[6] |
| Power supply | — | Suss CIC 1000 Power Supply[6] |
| Optics | — | UV400 Optics for 365nm and 405nm exposure[6] |
| Objectives | — | 5x and 10x objectives[6] |
| Auto-alignment system | — | Suss Auto-alignment System[6] |
| Microscope | — | Suss DVM8 Microscope[6] |
| Vintage | — | 1999[6] |
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