Waferpedia

Comparison ledger

F10-RTversus, Vistec INS 3000

Filmetrics F10-RT, Leica , Vistec INS 3000, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
F10-RTFilmetrics
OEMFilmetricsLeica
Category——
Wafer size6"200mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyFilmetrics F10-RTLeica , Vistec INS 3000
Specifications
Instrument typeoptical spectrometer[1]—
Use in source examplemeasured reflectivity of a 9-period SiO2/Ta2O5 DBR[2]—
Example measurement wavelengthhigh reflectivity at approximately 1050 nm[2]—
Alternate nameF10RT[1]—
Measurement capabilityReflectivity[2]—
Wafer size—Single 150/200 mm wafer loadport[3]
Type—Optical defect review station[3]
Wafer loadport—Single 150/200 mm wafer loadport[3]
Lighting—Bright field light source; DIC DUV light source[3]
Camera—UV and DUV camera[3]
Optics—6 optics: 150x, 100x, 50x, 25x, 10x, 5x[3]
Software—Viscon Software[3]
Data interface—KLARF input[3]
Sources (3)Every fact above is drawn from these public sources
  1. [1]wiki.nanofab.ucsb.eduwiki.nanofab.ucsb.edu
  2. [2]wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
  3. [3]dealer listingwotol.com