Comparison ledger
KLA .204 PSL Wafer, KLA Surfscan SP 2 Particle Defect, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ||
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | 300mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .204 PSL Wafer | KLA Surfscan |
| Specifications | ||
| Configuration | NIST Traceable[1] | Includes HDD[4] |
| Wafer Size | 8 inch[2] | — |
| Traceability | NIST[3] | — |
| Compatible Tools | Surfscan 6xy0, Sp1[1] | — |
| NIST Traceable | Yes[2] | — |
| Compatible tools | Surfscan 6xy0 and Sp1 particle counters[2] | — |
| P/N | — | 0074965-000[4] |
| Handler Type | — | Vacuum 300mm/200mm[6] |
| Defect sensitivity | — | <37 nm on polished bare silicon[4] |
| Technology nodes | — | 90, 65, & 45 nm[4] |
| Inspection modes | — | Standard Throughput Inspection Mode, High Sensitivity Inspection Mode[4] |
| Illumination | — | Oblique Illumination; DF (Oblique, Normal) ST and LT Mode[5] |
| Collection | — | Wide & Narrow[5] |
| Software version | — | 5.40[5] |
| Included licenses | — | Optical Filter, Enhanced XY Coordinates, 2 mm Edge Exclusion, Standard Classification Package, LPD-N Classification, LPD-ES Classification, Grading & Sorting, Haze, Haze Analysis & Normalization, Haze Line Classification, IDM 2011 Vintage[4] |
| Operating system | — | Microsoft Windows XP[4] |
| Wafer handler | — | 300 mm Phoenix Dual FIMS Vacuum Wafer Handler (PP) Ballroom Configuration; Phoenix 2.0 Handler[4] |
| Wafer size | — | Includes 300 mm Phoenix Dual FIMS Vacuum Wafer Handler (PP)[4] |
| Software vs | — | 5.40[5] |
| OEM | — | KLA[4] |
| Model | — | Surfscan SP 2[4] |
| Wafer Sizes | — | 12 inch[4] |
| Particle sensitivity | — | <37 nm defect sensitivity on polished bare silicon[4] |
| Illumination mode | — | Oblique illumination[4] |
| Included components | — | UV Laser; defect map & histogram with zoom; iMicroView measurement capability; SURFimage; Real-Time Defect Classification (RTDC); Microsoft Windows XP Operating System[4] |
| Handler | — | 300 mm Phoenix Dual FIMS Vacuum Wafer Handler (PP) Ballroom Configuration (Standard)[4] |
| Category | — | Metrology & Inspection[6] |
| Wafer sizes supported | — | 6, 8, and 12 inches[6] |
| Optics | — | UV Laser[6] |
| Performance | — | Optimized Sensitivity & Throughput[4] |
| Defect classification | — | Real-Time Defect Classification (RTDC)[4] |
| Control system | — | Microsoft Windows XP Operating System[4] |
| Load ports | — | 1 Shinko Load Port / 1 Rorze Port[5] |
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