Comparison ledger
KLA .204 PSL Wafer, Zeiss 1540EsB, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1540EsBZeiss | |
|---|---|---|
| OEM | KLA | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .204 PSL Wafer | Zeiss 1540EsB |
| Specifications | ||
| Configuration | NIST Traceable[1] | — |
| Wafer Size | 8 inch[2] | — |
| Traceability | NIST[3] | — |
| Compatible Tools | Surfscan 6xy0, Sp1[1] | — |
| NIST Traceable | Yes[2] | — |
| Compatible tools | Surfscan 6xy0 and Sp1 particle counters[2] | — |
| System type | — | FIB/SEM system[4] |
| Electron column | — | FESEM electron column[4] |
| Imaging resolution | — | resolution approaching the 2 nm range[4] |
| Ion column | — | Ga ion column[4] |
| Milling capability | — | allows for milling (sputtering) of materials from the sample[4] |
| Deposition materials | — | Pt, W, and SiOx[4] |
| Gas Injection System etch gases | — | XeF2 and H2O[4] |
| Detector options | — | multiple detector options for different imaging modes[4] |
| Gas delivery | — | XeF2 and H2O[6] |
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