Comparison ledger
KLA .204 PSL Wafer, Zeiss Supra 55, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Supra 55Zeiss | |
|---|---|---|
| OEM | KLA | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .204 PSL Wafer | Zeiss Supra 55 |
| Cited variants | — | |
| Specifications | ||
| Configuration | NIST Traceable[3] | Detectors:[6] |
| Wafer Size | 8 inch[4] | — |
| Traceability | NIST[5] | — |
| Compatible Tools | Surfscan 6xy0, Sp1[3] | — |
| NIST Traceable | Yes[4] | — |
| Compatible tools | Surfscan 6xy0 and Sp1 particle counters[4] | — |
| Electron Source Type | — | Schottky thermal field emission source (FESEM)[2] |
| Accelerating Voltage | — | 0.2 to 30 kV[7] |
| Accelerating Voltage (VP variant) | — | 0.1 to 30 kV[8] |
| Imaging Resolution (High Vacuum, 15 kV) | — | 1.0 nm[8] |
| Imaging Resolution (High Vacuum, 1 kV) | — | 1.7 nm[8] |
| Imaging Resolution (High Vacuum, 0.2 kV) | — | 3.5 nm[8] |
| Imaging Resolution (VP mode, 30 kV) | — | 2.0 nm[8] |
| Resolution (general range) | — | 2 nm[2] |
| Magnification Range | — | 12 - 900,000x[8] |
| Probe Current | — | 4 pA to 10 nA (20 nA optional)[8] |
| Variable Pressure Range | — | 2 to 133 Pa, adjustable in steps of 1 Pa[8] |
| Detectors | — | InLens SE, E-T (SE2), AsB (backscattered), CL (cathodoluminescence), STEM, EDS, EBSD[6] |
| Sample Stage | — | 5-Axes (X, Y, Z, R, T) Motorized Cartesian[8] |
| Operating System | — | Windows 7 32-bit with Smartsem v5.05[6] |
| Load-Lock System | — | FJELD Airlock[6] |
| Pumps | — | Adixen rough pump (airlock), Edwards RV12 oil rough pump (chamber)[6] |
| Chiller | — | ATC Chiller[6] |
| Model | — | Supra 55[6] |
| Equipment type | — | Scanning Electron Microscope (SEM)[6] |
| Source type | — | FESEM[2] |
| Electron source | — | Schottky thermal field emission source[2] |
| Electron image resolution | — | 1.0 nm (@ 15 kV), 1.7 nm (@ 1 kV), 3.5 nm (@ 0.2 kV), 2.0 nm (@ 30 kV in VP mode)[8] |
| Magnification | — | 12 - 900,000x[8] |
| Variable pressure range | — | 2 - 133 Pa, adjustable in steps of 1 Pa[8] |
| Acceleration voltage | — | 0.1 - 30 kV[8] |
| Probe current | — | 4 pA - 10 nA (20 nA optional)[8] |
| Accessory | — | FJELD Airlock[6] |
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