Comparison ledger
KLA 2367, KLA .496 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 2367KLA | |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | Only one wafer size at a time | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 2367 | KLA .496 PSL Wafer |
| Specifications | ||
| SW Version | 10.4.507[1] | — |
| Wafer size | Only one wafer size at a time[1] | 8 inch[4] |
| 300 mm (12") | Yaskawa + Asyst ISO Port or[1] | — |
| Configuration | Shinko LP[1] | NIST Traceable[4] |
| 200 mm (8") | Yaskawa + Asyst Versa Port (SMIF)[1] | — |
| GL | G Line[1] | — |
| IL | I Line[1] | — |
| VIS | Visible[1] | — |
| Equipment type | UV/visible brightfield inspector[2] | — |
| Inspection focus | sensitivity to a broad range of yield-relevant defect types[2] | — |
| Design node | 65nm and above[2] | — |
| Wafer sizes | 8 inch, 12 inch[1] | — |
| Wafer handling | only one wafer size at a time[1] | — |
| Software version | 10.4.507[1] | — |
| Lighting modes | GL: G Line; IL: I Line; VIS: Visible[1] | — |
| Inspection thresholds | 0.12 UV/GL/IL; 0.16 UV/GL/IL; 0.20 UV/GL/IL; 0.25 VIS; 0.39 VIS; 0.62 VIS[1] | — |
| Category | Metrology & Inspection[3] | Metrology & Inspection[5] |
| Optical modes | GL: G Line; IL: I Line; VIS: Visible[1] | — |
| Resolution / sensitivity options | 0.12 UV/GL/IL; 0.16 UV/GL/IL; 0.20 UV/GL/IL; 0.25 VIS; 0.39 VIS; 0.62 VIS[1] | — |
| Inspection type | UV/visible brightfield inspector[2] | — |
| Node coverage | 65nm and above design nodes[2] | — |
| Throughput | Significantly improved throughput over its predecessor; 2x data rate increase over previous generation brightfield tools[2] | — |
| Traceability | — | NIST Traceable[4] |
| Compatible systems | — | Capable on Surfscan 6xy0 and SP1[4] |
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