Comparison ledger
Lam Research Rainbow 4506 I, Tegal 110, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Rainbow 4506 ILam Research | 110Tegal |
|---|---|---|
| OEM | Lam Research | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Rainbow | Tegal 110 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | Oxide Etch[2] | — |
| Wafer type | Jeida flat[2] | — |
| Valve type | AC4 Throttle / VAT Throttle[2] | — |
| Software | Classic 7.31-42[2] | — |
| RF | PDW2200 400Kc generator (main chamber)[2] | — |
| Robot type | Harmonic Drive[2] | — |
| Loader type | Hine indexers 38A[2] | — |
| Loadlock | Entrance (ISO chmbr) and Exit LL[2] | — |
| Turbo pumps | No[2] | — |
| Controllers | VAT controller ISO THV / AC4 controller main chamber THV[2] | — |
| GAS 1 | Ar: 500 sccm[2] | — |
| GAS 2 | CF4: 100 sccm[2] | — |
| GAS 3 | CHF3: 50 sccm[2] | — |
| GAS 4 | He: 1000 sccm[2] | — |
| GAS 5 | O2: 20 sccm[2] | — |
| GAS 6 | N2: 540 sccm[2] | — |
| Type | Plasma etcher[3] | — |
| Wafer sizes | 6 inch, 8 inch[2] | — |
| Process | Oxide etch[2] | — |
| Endpoint | Monochromator Endpoint[2] | — |
| RF cart | Present[2] | — |
| ISO module | Present[2] | — |
| GAS 7 | NF3: 1150 sccm[2] | — |
| GAS 8 | He: 480 sccm[2] | — |
| model | — | 110 SE[1] |
| application focus | — | process development applications[1] |
| process capability | — | deep silicon plasma etching[1] |
| capabilities | — | very high aspect ratio trench etch and profile control[1] |
| configuration | — | multiple configurations with minimum technical intervention[1] |
| System type | — | plasma etch system[4] |
| Supported components | — | MEMS and 3D-IC components[1] |
| Control capability | — | very high aspect ratio trench etch and profile control[4] |
| Physical description | — | compact[1] |
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