Comparison ledger
Laurell EDC-650, Leica , Vistec INS 3000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | EDC-650Laurell | , Vistec INS 3000Leica |
|---|---|---|
| OEM | Laurell | Leica |
| Category | — | — |
| Wafer size | 100mm | 200mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Laurell EDC-650 | Leica , Vistec INS 3000 |
| Specifications | ||
| Model | EDC-650[1] | — |
| Equipment name in source | Laurell EDC-650 Spin Processor #2 (Primary Litho)[1] | — |
| Wafer handling | Unclamped pieces (mounted on carrier wafer), 100 mm round wafers, 150 mm round wafers, 100 mm × 100 mm square wafers[1] | — |
| Wafer size | — | Single 150/200 mm wafer loadport[2] |
| Type | — | Optical defect review station[2] |
| Wafer loadport | — | Single 150/200 mm wafer loadport[2] |
| Lighting | — | Bright field light source; DIC DUV light source[2] |
| Camera | — | UV and DUV camera[2] |
| Optics | — | 6 optics: 150x, 100x, 50x, 25x, 10x, 5x[2] |
| Software | — | Viscon Software[2] |
| Data interface | — | KLARF input[2] |