Waferpedia

Laurell

EDC-650

100mmLaurell EDC-650 family
Research Quality: 40% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

LaurellEDC-650
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What it is

The Laurell EDC-650 is a spin processor, a class of equipment used for applying uniform thin films of photoresist or other liquids onto substrates by centrifugal force. The EDC-650 series is designed for solvent-based and aqueous-based processing, including etch-rinse-dry, develop-rinse-dry, and cleaning applications. The system features a zero-porosity Teflon fluid path with an onboard dispense valve manifold and a clear ECTFE domed lid for process visibility.[2]

How it works

Spin processors operate by holding a substrate on a rotating chuck, typically using vacuum hold-down, while a liquid is dispensed onto the center of the substrate. Centrifugal force spreads the liquid into a thin, uniform film. The EDC-650 series uses a digital process controller that can manage multiple dispense steps and spin speeds. The system includes a clear lid, safety interlocks, and an adjustable down-flow exhaust to control the process environment.[2]

The EDC-650-15B model is capable of 12,000 RPM with vacuum hold-down, but is recommended for operation at 3,000 RPM, especially with non-vacuum chucks. The system's 650-series controller allows real-time interaction, pausing, and process continuation. The controller can be used with PC software (Spin 3000) for remote operation and process recording, though programming can be done without a PC. The housing is typically made from a solid co-polymer blend or optionally from PTFE/Teflon for chemical resistance.[3]

The process chamber is designed with a labyrinth seal to protect the motor and electronics from chemical contamination, and a Nitrogen purge is available. The lid and internal bowl shape control liquid flow from dispense to drain, minimizing drips. The system includes a bowl-wash and dry routine that can be added to any process.[3]

What can it run?

Process applications and technology nodes documented for this tool.

  • Primary Litho

What do the numbers mean?

Wafer handling1

Wafer handling
Unclamped pieces (mounted on carrier wafer), 100 mm round wafers, 150 mm round wafers, 100 mm × 100 mm square wafers[1]
Accurate?

Configuration & options2

Model
EDC-650[1]
Accurate?
Equipment name in source
Laurell EDC-650 Spin Processor #2 (Primary Litho)[1]
Accurate?
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Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What is the maximum spin speed of the EDC-650-15B?

The EDC-650-15B is capable of 12,000 RPM with vacuum hold-down, but is recommended for operation at 3,000 RPM, especially with non-vacuum chucks.[3]

Does the EDC-650 series use vacuum or non-vacuum chucks?

The system has vacuum hold-down capability, but a non-vacuum chuck is always recommended for etch-rinse-dry, develop-rinse-dry, and cleaning processes. Non-vacuum chucks are available in English or metric sizes, as well as small fragment and high porosity versions for thin films.[2][3]

What materials are used for the fluid path and housing?

The fluid path is zero-porosity Teflon. The housing is typically made from a solid co-polymer blend or optionally from PTFE/Teflon (Hostaflon TFM-1600). The lid is made of clear ECTFE, and non-wetted areas use ECTFE-coated 316 stainless steel screws.[2][3]

Can the EDC-650 be programmed and controlled remotely?

The 650-series controller can be used with a PC running Laurell's Spin 3000 software for remote operation, process recording, and LAN/Internet communication. However, the equipment can be programmed and run without a PC, using the onboard controller.[3]

Not publicly documented

The following facts about the EDC-650 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EDC-650 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the EDC-650 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the EDC-650 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the EDC-650 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the EDC-650 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]confluence.nanofab.ualberta.caconfluence.nanofab.ualberta.caconfluence.nanofab.ualberta.ca
  2. [2]EDC-650 Series - Laurell Technologiesimages.laurell.comimages.laurell.com
  3. [3]EDC-650-15B Spin Processorpremier-sols.compremier-sols.com
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Last updated Aug 13, 2026.

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