Comparison ledger
Laurell WS-650MZ-23NPPB, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | WS-650MZ-23NPPBLaurell | 1000FPYES |
|---|---|---|
| OEM | Laurell | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Laurell WS-650MZ-23NPPB | YES 1000FP |
| Specifications | ||
| Facility equipment category | Wet Processing[1] | — |
| OEM | Laurell[2] | — |
| Model | WS-650Mz-23NPPB[2] | Glen/YES 1000FP[3] |
| Equipment type | Spin coater[2] | — |
| Maximum rotational speed | 12,000 rpm[2] | — |
| Speed accuracy | ≤1 rpm[2] | — |
| Maximum acceleration | 80,000 rpm/s no-load; 30,000 rpm/s loaded[2] | — |
| Substrate diameter | 10–150 mm round; up to 125 × 125 mm square[2] | — |
| Chamber diameter | 9.5 in (241 mm)[2] | — |
| Chamber material | NPP (natural polypropylene)[2] | — |
| Vacuum pump | Oil-free, 220–240 V AC, 50/60 Hz, 4.5 SCFM (0.11 m³/min), adjustable vacuum range 25–28 inHg (635–711 mmHg)[2] | — |
| Programmable steps | ≥20 programs, each with ≥51 speed/time steps[2] | — |
| Timer resolution | 0.1 s (1–5999.9 s/step)[2] | — |
| PLC controller accuracy | <0.006% setpoint[2] | — |
| System type | — | Plasma cleaning system[3] |
| Line | — | R-Series Plasma Cleaning Systems (Glen Technologies)[3] |
| Designed use | — | Designed to accept a range of shelf sizes[3] |
| Application focus | — | Changing needs of the flat panel industry[3] |
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