Laurell
WS-650MZ-23NPPB
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Laurell WS-650MZ-23NPPB is a spin coater. The Laurell WS-650MZ-23NPPB accommodates up to 150 mm wafers and 125 mm × 125 mm square substrates. The Laurell WS-650MZ-23NPPB reaches a maximum rotational speed of 12,000 rpm.[1][2]
Plate 01Laurell SpinCoater WS-650Mz-23NPPB / 라우렐 스핀코터 WS-650Mz-23NPPB 전원테스트영상
주식회사 엔지니어스톡Watch on YouTubePlate 02Laurell WS-650MZ-23NPPB / 라우렐 스핀코터 WS-650MZ-23NPPB 전원테스트영상
주식회사 엔지니어스톡Watch on YouTubePlate 03Laurell WS-650MZ-23NPPB 라우렐 스핀코터 / Spincoater 멤브레인스위치불량 전원 및 동작테스트영상
주식회사 엔지니어스톡Watch on YouTubePlate 04Laurell WS-650MZ-23NPPB SpinCoater / 라우렐 스핀코터 WS-650MZ-23NPPB 실험용전자장비 전원테스트영상
주식회사 엔지니어스톡Watch on YouTube
What it is
The Laurell WS-650MZ-23NPPB is a spin coater. The WS-650MZ-23NPPB belongs to Laurell's 650-series coater systems. The WS-650MZ-23NPPB has a maximum rotational speed of 12,000 rpm. The WS-650MZ-23NPPB accommodates round substrates from 10 mm to 150 mm and square substrates up to 125 × 125 mm. The WS-650MZ-23NPPB uses an NPP natural polypropylene chamber with a chamber diameter of 9.5 in or 241 mm.[1][4][2]
Where it fits in the process flow
General reference — not yet source-verifiedSpin coating sits in wet-process portions of microfabrication and materials workflows where a uniform liquid layer must be formed before later thermal, lithographic, or etch steps. Spin coaters are commonly used before exposure or pattern transfer when a resist or other solution-based layer must first be applied to the substrate. Spin coaters also appear in cleaning and rinse-dry sequences where rotational removal of liquid is useful after a wet chemical step.
Applications
General reference — not yet source-verifiedSpin coaters are used to apply photoresist, polymers, sol-gel solutions, and other liquid formulations to planar substrates when a controlled thin film is needed. Spin coaters are common in semiconductor, microsystems, optics, and laboratory thin-film work, especially where subsequent baking, exposure, etching, lift-off, or characterization depends on coating uniformity.
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Laurell recommends single-use only because of known material conflicts.
- Photo resist and developer can cross-contaminate.
- SC-1 and SC-2 can create NH4Cl, which is described as a hazardous inhalation risk.
What do the numbers mean?
Power & electrical1
- Vacuum pump
- Oil-free, 220–240 V AC, 50/60 Hz, 4.5 SCFM (0.11 m³/min), adjustable vacuum range 25–28 inHg (635–711 mmHg)[1]
Wafer handling1
Optics & imaging1
Performance2
Configuration & options9
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Vacuum pumpOil-free, 220–240 V AC, 50/60 Hz, 4.5 SCFM (0.11 m³/min), adjustable vacuum range 25–28 inHg (635–711 mmHg)[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the WS-650MZ-23NPPB are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the WS-650MZ-23NPPB are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the WS-650MZ-23NPPB are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the WS-650MZ-23NPPB are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the WS-650MZ-23NPPB is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the WS-650MZ-23NPPB are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]instrumenthive.com — instrumenthive.cominstrumenthive.com
- [2]Spin Coater Laurell WS 650MZ 23NPPB | Beirut Arab University — bau.edu.lbbau.edu.lb
- [3]colorado.edu — colorado.educolorado.edu
- [4]Laurell WS-650Mz-23NPPB Advanced Spin Coater with Airflow Motor Protection & Bluetooth Control - InstrumentHive — instrumenthive.cominstrumenthive.com
Last updated Oct 16, 2026.
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