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Comparison ledger

WS-650MZ-23NPPBversus1000P

Laurell WS-650MZ-23NPPB, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMLaurellYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1998 Acquisition
Control system——
Generation——
FamilyLaurell WS-650MZ-23NPPBYES 1000P
Specifications
Facility equipment categoryWet Processing[1]—
OEMLaurell[2]—
ModelWS-650Mz-23NPPB[2]1000P[3]
Equipment typeSpin coater[2]—
Maximum rotational speed12,000 rpm[2]—
Speed accuracy≤1 rpm[2]—
Maximum acceleration80,000 rpm/s no-load; 30,000 rpm/s loaded[2]—
Substrate diameter10–150 mm round; up to 125 × 125 mm square[2]—
Chamber diameter9.5 in (241 mm)[2]—
Chamber materialNPP (natural polypropylene)[2]—
Vacuum pumpOil-free, 220–240 V AC, 50/60 Hz, 4.5 SCFM (0.11 m³/min), adjustable vacuum range 25–28 inHg (635–711 mmHg)[2]—
Programmable steps≥20 programs, each with ≥51 speed/time steps[2]—
Timer resolution0.1 s (1–5999.9 s/step)[2]—
PLC controller accuracy<0.006% setpoint[2]—
System type—Plasma cleaning system[3]
Shelf configuration—Four 16 x 16 inch shelves[3]
Total capacity—1024 square inches[3]
Control system—PLC driven with plain English real time process readout and diagnostics in the event of system abort[3]
Number of shelves—4[3]
Shelf size—16 x 16 inches[3]
Power—1000 W[4]
Configuration—Parallel plate[4]
Operation modes—Active, RIE, Downstream[3]
Sample size range—From smallest semiconductor chip to large flat panels[3]
Type—Plasma cleaning system[3]
Shelves—Four 16 x 16 inch shelves[3]
Control—PLC driven with plain English real time process readout and diagnostics in the event of system abort[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]colorado.educolorado.edu
  2. [2]instrumenthive.cominstrumenthive.com
  3. [3]web.archive.orgweb.archive.org
  4. [4]semistarcorp.comsemistarcorp.com